Vacuum Plating Machine for Crystal
Vacuum Plating Machine for Crystal is high efficient plating equipment with multifunction. It is able to make film on the surface of metal products and nonmetallic products. It can coat metal film and compound film, multilayer super hard film, gold doping film, alloy film containing titanium nitride, titanium carbide, zirconium nitride, chromium nitride, titanium, nickel, chromium and copper. Moreover, the entire processing technological process can be finished in a very short time.
Vacuum Plating Machine for Crystal mainly integrates technology of DC magnetron sputtering, intermediate-frequency sputtering and arc ion evaporation. With the combination of linear ionization source and pulse bias coating, this equipment can make various properties of thin film of deposited particles improved. It can coat alloy film, compound film and multilayer complex film on metal products and nonmetal products. After many years research of our engineers on special cathode arc ion and non balance magnetron system, we have developed a whole set of PROPOWER series of computer automatic control system, making the plating film adhesive and dense, the consistency of repeated plating better. We solve the problems of complicated manual operation and inconsistent film colors.
Vacuum Plating Machine for Crystal is widely used in watches, mobile shell, hardware, sanitary ware, tableware, cutting tool, wear-resisting mould etc. It can coat TiN, TiCN, CrN, TiNbN TiALN, TiCrN, TiNC, and all kinds of DLC film.
A. Magnetron sputtering principle is based on the theory of cathodic glow discharge, expand the cathode magnetic on the surface to the work-piece surface. It improves the ionization of sputtering atoms. It keeps the film exquisite and increase the gloss.
B.It has reliable performance, and it can work in 30A current when optimizing cathode and magnetic structure. The coating layer and substrate basement have produced atomic diffusion will help ion beam deposit.
5.Parameter of the machine
|Dimension||Φ 900Χ 1000mm||Φ 1100Χ 1000mm||Φ 1300Χ 1100mm||Φ 1600Χ 1200mm|
|Main confirguration||3 electric-arc+2 pairs of plane rectangular cathode||6 electric-arc+2 pairs of cylindrical cathode+a pairs of plane rectangular cathode||5 electric-arc+4 pairs of cylindrical cathode+a pairs of plane rectangular cathode||6 electric-arc+8 pairs of cylindrical cathode+a pairs of plane rectangular cathode|
|Film type||Metal films, Dielectric films, Compound films, Reaction films, Muti-layer function films|
|Power source||Electric arc power supply, DC magnetron power supply, MF magnetron power supply. Pulse bias voltage power supply. ion source power supply.|
|Process gas control||Quality flowmeter + electromagnetism ceramic valve|
|Vacuum chamber structure||Vertical single(side) door, pump system postposition, double water-cooling|
|Vacuum system||Molecule pump(diffusion pump)+Roots pump +Mechanical pump (8.0*10 -4 Pa)|
|Pump speed||Pumping time less than 15 minutes, from atmospheric pressure to 3Χ 10 -3 Pa|
|Workpiece motion mode||Public rotation Frequency control: 0-20 rotation per minute|
|Control mode||Full automation control system PC+PLC/PC+HMI|
The coating experts of your own company:Full set solution for the coating production
ZHICHENG can help you to enter the PVD coating easily by our vacuum coating machine and full range service. We will provide most suitable technology according to your requirements.
Moreover We will make the unique coating solution for each customer; combine with the full set production technics to meet your requirements, and ensure high efficiency of production.
We developed a complete after-sales system and effective service measures. Company owns a professional after-sales service team with experienced engineers.
Please feel free to contact us for further information!
Contact Person: Lily Zhou
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